Publication:
Bit flipping effect on 6T, 7T and 10T static random access memory by TCAD simulation

dc.contributor.affiliation#PLACEHOLDER_PARENT_METADATA_VALUE#en_US
dc.contributor.authorMahmud, Manzaren_US
dc.date.accessioned2024-10-08T03:21:48Z
dc.date.available2024-10-08T03:21:48Z
dc.date.issued2016
dc.description.abstractIn space there are many high energetic particles and rays which potentially hazardous to microelectronic circuits and systems. The study of electrical characterization with radiation effect is important for any space exploration as high energetic particles and rays of space seriously limiting the reliability of electronic devices like memory cell. Bit flipping is one of the most common radiation effect found in space environment for memory cell like Static-RAMs (SRAMs). To protect SRAMs from bit flipping effect, it is important to know the sensitive striking position and intensity threshold point of SRAMs. Technology Computer Aided Design (TCAD) have always been viable alternatives for characterizing bit flipping as it is difficult, hazardous and costly to emulate high energy space particles in the lab. This research presents TCAD simulation for bit flipping effect on 6T, 7T and 10T SRAMs. A comparison study of intensity threshold point along with most sensitive striking area for SRAM cell are presented in this research. The intensity threshold study with Silicon over Insulator (SOI) technology is also presented for 10T SRAM. In this study, simulation of bit flipping were done using pulsed optical beam by MixedMode feature of ATLAS from Silvaco Inc. MixedMode is a mixed circuit and device simulator which can handle both circuit and device simultaneously. In the MixedMode study, SRAM cells were simulated by using SPICE coding where targeted transistor is a physically based device. The results show that, midpoint of drain is the most sensitive node for any radiation strike. It is also found that, for these particular structures, intensity threshold is increasing with the increase of transistor number in the SRAM and with the SOI technology intensity threshold increased significantly.en_US
dc.description.callnumbert TK 7895 M4 M215B 2016en_US
dc.description.degreelevelMasteren_US
dc.description.identifierThesis : Bit flipping effect on 6T, 7T and 10T static random access memory by TCAD simulation /by Manzar Mahmuden_US
dc.description.identityt11100350395ManzarMahmuden_US
dc.description.kulliyahKulliyyah of Engineeringen_US
dc.description.notesThesis (MSEE)--International Islamic University Malaysia, 2016.en_US
dc.description.physicaldescriptionxv, 72 leaves :ill. ;30cm.en_US
dc.description.programmeMaster of Science (Electronics Engineering)en_US
dc.identifier.urihttps://studentrepo.iium.edu.my/handle/123456789/7302
dc.identifier.urlhttps://lib.iium.edu.my/mom/services/mom/document/getFile/eIWjMkcvNBup4sDl3An2DSkXKiIPoUdY20161104115658287
dc.language.isoenen_US
dc.publisherKuala Lumpur : Kulliyyah of Engineering, International Islamic University Malaysia, 2016en_US
dc.rightsCopyright International Islamic University Malaysia
dc.subject.lcshStatic random access memoryen_US
dc.titleBit flipping effect on 6T, 7T and 10T static random access memory by TCAD simulationen_US
dc.typeMaster Thesisen_US
dspace.entity.typePublication

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